BASF has declared plans to build a modern-day Electronic Grade Ammonium Hydroxide (NH₄OH EG) plant at its Ludwigshafen site, moreover supporting its commitment to assist Europe’s developing semiconductor industry. The latest facility will create extremely-pure ammonium hydroxide for wafer cleansing, etching, and other precision procedure important to semiconductor production. Operations are anticipated to start in 2027.
This investment underscores BASF’s strategic target on strengthening supply chain resilience for the European semiconductor sector—a main driving of technological innovation and competitiveness. As Europe increases its semiconductor expansion, with numerous new chip fabrication plants below production, the requirement for high-quality, high-purity chemicals continues to accelerate. The latest Ludwigshafen plant will assist meet this increasing needs, making sure a stable local supply of important materials for advanced chip manufacturing.
BASF’s decision is also assisted by close collaboration with a main companion recently constructing a new chip production facility in Europe. The investment displays long-time customer commitments and strategic partnerships throughout the semiconductor value chain, enhancing mutual development and innovation.
The NH₄OH EG produced at the new plant will play a crucial function in permitting advanced-node chip technologies crucial for industries including car, artificial intelligence, and next-generation electronics.
“We are thankful and proud with our customers’ trust in BASF to be a long-term strategic companion of their development aims within the region,” stated Jens Liebermann, Senior Vice President, Electronic Materials at BASF. “This new investment now not enhances our manufacturing capabilities however also strengthens our commitment to assisting the semiconductor industry in Europe.”
Gops Pillay, President, Global Operating Division at BASF, added, “Our new facility represents an vital milestone in reinforcing Europe’s semiconductor ecosystem and using sustainable innovation across main technologies.”
