Diversified worldwide producer Asahi Kasei will expand PIMEL photosensitive polyimide (PSPI) manufacturing capacity at its Fuji City facility in Shizuoka Prefecture, Japan.
PSPI is a main material for the global electronics industry, specially used for buffer coatings and passivation layers in semiconductor applications. By increasing its capacity via 2030, Asahi Kasei reinforces its commitment to developing its Electronics business and supporting its role as a main provider for the global semiconductor industry.
Asahi Kasei has predicted that the need for next-generation semiconductor interlayer insulation will continue to produce quickly at a average yearly growth rate of 8%. In response to this fast increasing requirement, Asahi Kasei finished the construction of a brand new plant generating PIMEL photosensitive polyimide in Fuji City, Shizuoka Prefecture, in December 2024. Since then, the corporation has decided to increase manufacturing in Fuji City further, increasing the 2024 capacity by 2030.
This enlargement is anticipated to considerably enhance the deliver resilience of important materials within the production of semiconductors. Asahi Kasei will make investments about ¥16 billion on this enlargement.
PIMEL is used international for numerous semiconductor applications, including buffer coatings that enhance adhesion among distinct semiconductor materials and act as protective limitations.
Nobuko Uetake, Senior Executive Officer of Asahi Kasei and main chief in the corporation’s electronics materials business, commented, “The rapid development of generative AI and different advanced technologies is using extraordinary demand for semiconductor substances like PIMEL PSPI. This funding positions Asahi Kasei to capture that develop by improving our supply capability and reinforcing our role as a dependable partner to global semiconductor producers. It helps our broader approach to construct long-term value price in high-growth, excessive-effect sectors.”
